Fundamental Investigations in the Design of Five-Axis Nanopositioning Machines for Measurement and Fabrication Purposes

The majority of nanopositioning and nanomeasuring machines (NPMMs) are based on three independent linear movements in a Cartesian coordinate system. This in combination with the specific nature of sensors and tools limits the addressable part geometries. An enhancement of an NPMM is introduced by the implementation of rotational movements while keeping the precision in the nanometer range. For this purpose, a parameter-based dynamic evaluation system with quantifiable technological parameters has been set up and employed to identify and assess general solution concepts and adequate substructures. Evaluations taken show high potential for three linear movements of the object in combination with two angular movements of the tool. The influence of the additional rotation systems on the existing structure of NPMMs has been investigated further on. Test series on the repeatability of an NPMM enhanced by a chosen combination of a rotary stage and a goniometer setup are realized. As a result of these test series, the necessity of in situ position determination of the tool became very clear. The tool position is measured in situ in relation to a hemispherical reference mirror by three Fabry–Perot interferometers. FEA optimization has been used to enhance the overall system structure with regard to reproducibility and long-term stability. Results have been experimentally investigated by use of a retroreflector as a tool and the various laser interferometers of the NPMM. The knowledge gained has been formed into general rules for the verification and optimization of design solutions for multiaxial nanopositioning machines.