USING THIN-FILM X-RAY-DIFFRACTION TO STUDY ION-IMPLANTED METAL

Thin-film X-ray diffraction is a new surface analysis technique which is highly sensitive and non-destructive, and can measure the structure of thin films with thickness of approximately 0.1 mum. Using this new technique, the surface compounds of a N+ implanted layer can be detected, which explain the improvement of properties of ion implanted No. 20 steel and Cr-coated iron.