Understanding nanomechanical and surface ellipsometry of optical F-doped SnO 2 thin films by in-line APCVD
2020
In this paper, a production-type chemical vapour deposition (CVD) is utilized to deposit fluorine
doped tin oxide thin films of different thicknesses and dopant levels. Deposited films showed a
preferred orientation along the (200) plane of a tetragonal structure due to the formation of
halogen rich polar molecules during the process. A holistic approach studying elastic modulus
and hardness of resulting films by a high-throughput atmospheric-pressure CVD process is
described. The hardness values determined lie between 8 - 20 GPa. For a given load, the modulus
generally increased slightly with the thickness. The average elastic recovery for the coatings was
found to be between 45 – 50 %. Refractive index and thickness values derived from the fitted
ellipsometry data were in excellent agreement with independent calculations from transmission
and reflection data.
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