A coupled adaptive PI tuning method for rapid thermal processing systems

A coupled adaptive PI tuning method for rapid thermal chemical vapor deposition systems (RTCVD) is proposed in this paper. RTCVD, as one of rapid thermal processing (RTP) craft, is the main method to produce polycrystalline silicon thin films. The temperature in the furnace is crucial to the quality of polycrystalline silicon thin films, which has great influence on semiconductor industries. To improve the quality of the films, a coupled adaptive PI tuning method based on simultaneous perturbation stochastic approximation (SPSA) algorithm is applied to the RTCVD systems. Simulation results show that satisfactory performances can be obtained using the proposed tuning method.