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Reacive Etching of InGaN with HI Neutral-Beam Etching
Reacive Etching of InGaN with HI Neutral-Beam Etching
2021
Takahiro Sawada
Takahiro Ishihara
Daisuke Ohori
Xue-Lun Wang
Seiji Samukawa
Keywords:
Materials science
Optoelectronics
Beam (structure)
Etching (microfabrication)
Correction
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