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Fabrication of low‐threshold InGaAs/GaAs ridge waveguide lasers by using in situ monitored reactive ion etching
Fabrication of low‐threshold InGaAs/GaAs ridge waveguide lasers by using in situ monitored reactive ion etching
2008
C.P. Chao
S.Y. Hu
P.D. Floyd
K.-K. Law
James L. Merz
A. C. Gossard
Keywords:
ridge waveguide lasers
Reactive-ion etching
Fabrication
Optoelectronics
Ridge
Ion
Etching
In situ
Semiconductor laser theory
Materials science
Correction
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