Phase optimisation of PMN-PT thin films deposited by Pulsed Laser Deposition on MgO substrates and Pt-coated silicon

Stability and crystalline quality of PMN-PT (65/35) thin films deposited by Pulsed Laser Deposition on MgO <001> and MgO <111> are studied by X-Ray diffraction and Raman Scattering Spectroscopy. From these investigations, the stabilization of PMN-PT films on <111> Pt-coated silicon substrate is obtained by the integration of an oxide layer (La 0.66 Sr 0.33 MnO 3 ) on the Pt surface prior to the PMN-PT deposition. Physical properties are found to be very robust with a polarization up to 40µC/cm2 for an electric field as high as 1MV/cm.