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TiSi2/TiN-A Stable Multilayered Contact Structure for Shallow Implanted Junctions in VLSI Technology
TiSi2/TiN-A Stable Multilayered Contact Structure for Shallow Implanted Junctions in VLSI Technology
2017
S E Huq
R.A. McMahon
H. Ahmed
Wang Ying
Song Zhongxiao
Zhang Milin
Keywords:
Very-large-scale integration
Tin
Electronic engineering
Materials science
Engineering physics
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