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J161022 8-inch Wafer Distribution for The Plasma-induced Damage Using The Neutral Beam Etching
J161022 8-inch Wafer Distribution for The Plasma-induced Damage Using The Neutral Beam Etching
2012
Yuki Nishimori
Shinji Ueki
Seiji Samukawa
Gen Hashiguchi
Keywords:
Dry etching
Beam (structure)
Etching (microfabrication)
Reactive-ion etching
Plasma
Etching
Wafer
Analytical chemistry
Materials science
Optoelectronics
Correction
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