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Self-Assembled Triblock Copolymers as Templats to Fabricate Nanoporous Thin Films
Self-Assembled Triblock Copolymers as Templats to Fabricate Nanoporous Thin Films
2001
Shu Yang
Peter A. Mirau
Chien-Shing Pai
Omkaram Nalamasu
Elsa Reichmanis
Eric K. Lin
Hae-Jeong Lee
David W. Gidley
W. E. Frieze
J. P. Sun
Huagen Peng
T. L. Dull
Albert F. Yee
Keywords:
Dielectric
Thin film
Small-angle neutron scattering
Self-assembly
Ethylene oxide
Nanoporous
Polymer chemistry
Copolymer
Propylene oxide
Materials science
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