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Etching Characteristics with Ar-Cl₂ Gas Mixed Cluster Ion Beam
Etching Characteristics with Ar-Cl₂ Gas Mixed Cluster Ion Beam
2010
Toshio Seki
Takaaki Aoki
Jiro Matsuo
Keywords:
Ion beam
Reactive-ion etching
Analytical chemistry
Etching
Ion beam deposition
Chemistry
Materials science
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