Numerical optimization of SiN x antireflection coatings for crystalline silicon on glass solar cells

The transfer matrix method is used to calculate the reflectance of a crystalline silicon on glass solar cell with a silicon nitride layer (SiN x ) as antireflection coating (ARC). It is found that a SiN x double-layer ARC has little advantage over the single layer one. Among all SiN x double layer structures, the refractive index (and thickness) combination of 2.1 (35 nm) and 2.3 (40 nm) for the top and the bottom layer, respectively, is found to provide the highest short circuit current density (J sc ). The influence of the angle of incidence on the reflectance is also studied. The numerical optimization procedure and its results are presented.