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Characterization of slow traps in MOS interfaces of TiN/Y 2 O 3 /SiGe gate stacks
Characterization of slow traps in MOS interfaces of TiN/Y 2 O 3 /SiGe gate stacks
2021
Tsung-En Lee
Kasidit Toprasertpong
Mitsuru Takenaka
Shinichi Takagi
Keywords:
Materials science
Tin
gate stack
Optoelectronics
characterization
Correction
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