Deuterium ion beam irradiation onto the pulsed laser deposited tungsten thin films

The effect of 10, 20, and 30 keV deuterium (D) ion beam irradiation onto the optical quality of mirrorlike tungsten (W) thin films deposited by pulsed laser deposition technique is reported. The dependence of D ion energy on the changes in reflectivity of W mirrors after irradiation are explained on the basis of ion range, straggle length, and sputtering yield for 10, 20, and 30 keV of D ion beam. The ion range, straggle length, and sputtering yield were estimated numerically by Transport of Ions in Matter Monte Carlo simulation code. These mirrorlike thin films were subjected to scanning electron microscope and atomic force microscope to study surface morphology. The specular reflectivity of these mirrors before and after D ion beam exposure in ultraviolet–visible-far infrared range was compared.