Preliminary study of MoS 2 based saturable absorber used for crystal based mode locking laser system

Due to the extremely high pulse peak power produced by ultrafast laser and its potential applications for precious material processing and cutting e.g. sapphire wafer surface processing for mobile phone display technology, it has attracted great interests from the laser photonic industry. Apart from Semiconductor Saturable Absorber Mirror (SESAM), the carbon based materials e.g. carbon nano tube or graphene and graphene oxide materials have demonstrated mode locking successfully by using different types of gain materials with operational wavelengths at near 1 micron, 1.3 micron, 2 micron, confirming their wide operational waveband properties. These carbon based absorbers can be fabricated by some simple technique that can be used for mass production of the absorber e.g. dip coating, ultrasound, chemical process etc.