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Optical performance of laser light source for ArF immersion double patterning lithography tool
Optical performance of laser light source for ArF immersion double patterning lithography tool
2009
Katsuhiko Wakana
Hiroaki Tsushima
Shinichi Matsumoto
Masaya Yoshino
Takahito Kumazaki
Hidenori Watanabe
Takeshi Ohta
Satoshi Tanaka
Toru Suzuki
Hiroaki Nakarai
Yasufumi Kawasuji
Akihiko Kurosu
Takashi Matsunaga
Junichi Fujimoto
Hakaru Mizoguchi
Keywords:
Excimer laser
Laser
Materials science
Optics
Lithography
Next-generation lithography
Multiple patterning
Depth of focus
Extreme ultraviolet lithography
Correction
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