Resolution, LER and Sensitivity Limitations of Photoresists
2008
Recent experimental results and modeling both indicate that whereas it is possible to optimize a photoresist
and process to achieve separately a desired resolution or line edge roughness or sensitivity, it will be difficult
if not impossible to achieve all three simultaneously using current standard chemically amplified photoresists
and processes. This tradeoff among Resolution, Line Edge Roughness (LER) and Sensitivity is termed the RLS
tradeoff. Here we review the progress to date of a SEMATECH-funded program to develop an experimentally
verified model of the relationship among resolution, LER and sensitivity and use it to determine approaches for
"breaking" the RLS tradeoff.
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