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PS-b-PDMS graphoepitaxy in trilayer 193 nm photolithography patterns and transfer etching
PS-b-PDMS graphoepitaxy in trilayer 193 nm photolithography patterns and transfer etching
2013
Sophie Archambault
Mathieu Salaün
Cécile Girardot
M. Delalande
G. Cunge
Erwine Pargon
Olivier Joubert
M. Zelsmann
Keywords:
Optoelectronics
Photolithography
Etching
Materials science
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