Advanced photoresist and material development in China

The paper describes a brief situation of advanced photoresist development in China, which is either in mass production or in customer qualification loop, mainly for lithography process in 8–12 inch wafer fabrication of large scale integrated circuit. The resists and the materials introduced here are produced from different domestic factories. In this paper, their KrF and ArF types of photoresists and the materials are reported. The paper also codes the usage roadmap supplied by domestic resist makers in the future.