Microstrip gas chambers on implanted substrates

Abstract We have studied the performance of several Microstrip Gas Chamber (MSGC) prototypes made on standard Desag D263 boron implanted glass. The purpose of the implantation is to reduce the surface resistance. The long term stability of this implantation has been measured under applied bias voltage. Comparative tests have been carried out on prototypes made on implanted and unimplanted detectors under electron ( 90 Sr) and X-ray (8 keV) irradiation. The total dose was approximately 7 mC/cm.