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Vertical MBE Growth of Si Fins on Sub-10 nm Patterned Substrate for High-Performance FinFET Technology
Vertical MBE Growth of Si Fins on Sub-10 nm Patterned Substrate for High-Performance FinFET Technology
2021
Shuang Sun
Jianhuan Wang
Baotong Zhang
Xiaokang Li
Qifeng Cai
Xia An
Xiaoyan Xu
Jianjun Zhang
Ming Li
Keywords:
Optoelectronics
patterned substrate
Materials science
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