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Inorganic bottom ARC SiOxNy for interconnection levels on 0.18-μm technology
Inorganic bottom ARC SiOxNy for interconnection levels on 0.18-μm technology
1998
Yorick Trouiller
N. Buffet
Thierry Mourier
Yveline Gobil
Patrick Schiavone
Yves Quéré
Keywords:
Optoelectronics
Materials science
Interconnection
Arc (geometry)
Correction
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