X-ray microfocusing with off-axis ellipsoidal mirror

High-precision ellipsoidal mirrors for two-dimensionally focusing X-rays to nanometer sizes have not been realized because of technical problems in their fabrication processes. The objective of the present study is to develop fabrication techniques for ellipsoidal focusing mirrors in the hard-X-ray region. We design an off-axis ellipsoidal mirror for use under total reflection conditions up to the X-ray energy of 8 keV. We fabricate an ellipsoidal mirror with a surface roughness of 0.3 nm RMS (root-mean-square) and a surface figure error height of 3.0 nm RMS by utilizing a surface profiler and surface finishing method developed by us. The focusing properties of the mirror are evaluated at the BL29XUL beamline in SPring-8. A focusing beam size of 270 nm × 360 nm FWHM (full width at half maximum) at an X-ray energy of 7 keV is observed with the use of the knife-edge scanning method. We expect to apply the developed fabrication techniques to construct ellipsoidal nanofocusing mirrors.