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A New Concept for Spatially-Divided Reactive Ion Etching with ALD-Based Passivation
A New Concept for Spatially-Divided Reactive Ion Etching with ALD-Based Passivation
2013
F. Roozeboom
Bas Kniknie
Adriaan Marinus Lankhorst
Gjj Hans Winands
Raymond Knaapen
Mireille Smets
Paul Poodt
G Gijs Dingemans
W Wytze Keuning
W.M.M. Kessels
Keywords:
Reactive-ion etching
Passivation
Materials science
Inorganic chemistry
Optoelectronics
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