Modulated structures in amorphous films of Cr-silicide prepared by electron-beam-deposition

Abstract Amorphous Cr-silicide films are prepared by electron-beam-deposition on a Cu-substrate at room temperature. The microstructures of as-grown films are investigated using transmission and analytical electron microscopy. The morphology of the amorphous films is dendritic. In addition, one-dimensional concentration modulations are observed. The modulated structure is revealed not only by TEM imaging but also by a series of satellite spots at the centre of the diffraction pattern. This concentration modulation is confirmed by analytical electron microscopy.