TOTAL PROCESS CONTROL FOR ION IMPLANTATION

A new PC based total process control unit eliminates ion implanter setup errors and interlocks machine performance factors. The unit is able to connect to all batch and serial ion implanters of all makes and models. Link up time for field retrofit can be as little as one hour. The unit monitors, documents and controls all ion implant parameters including species, dose, energy, and ion beam current. The human interface is via windows driven recipes which are held on a hard drive. All implant statistics are backed onto any user specified drive and may be down loaded to a S.P.C. (Statistical Process Control), Database or spreadsheet program for trend analysis. This allows user specified critical parameters to be monitored and locked out on an on-going process.