Orientation and position-controlled block copolymer nanolithography for bit-patterned media

Bit-patterned media (BPM) is a candidate for high-density magnetic recording media. Directed self-assembly (DSA) is expected to be a solution for the fabrication process of high-density BPM. A BPM with 20 nm-pitch dot pattern is fabricated. A 100 nm-pitch triangle lattice dot pattern, which is fabricated by EB lithography, is used as a guide post to order PS-PDMS self-assembled diblock co-polymer with 20 nm pitch. Dot-pitch fluctuation and linearity of pseudo dot tracks are estimated. The standard deviation of the dot-pitch variation including the post guide is 8% of the self-assembled dot pitch. The dot-position deviation is estimated to be about 8% of the pseudo dot track pitch. In both cases, variation of the size and pitch of the post guides is found to increase the dot-pitch fluctuation and dot-position deviation from pseudo dot-track.