Real‐time simultaneous optical‐based flux monitoring of Al, Ga, and In using atomic absorption for molecular beam epitaxy

We have developed a multichannel atomic absorption measurement system for real‐time simultaneous monitoring of Al, Ga, and In molecular beam fluxes. In our configuration, distinct atomic emission lines from three hollow cathode lamps are combined into one beam, thus requiring only one pair of through view ports for the optical probe beam. Based on the dual beam optical configuration, the reference arm compensates for intensity drift of the light sources. In this work, we demonstrate the use of reflection high energy electron diffraction oscillations for calibrating the absorption signal.