Dual channel FinFETs as a single high-k/metal gate solution beyond 22nm node

We report on the promise of dual channel materials using FinFETs for high-performance CMOS for sub 22 nm technology node. We demonstrate pFinFETs with all SiGe channel formed by Germanium condensation onto a Silicon-On-Insulator carrier wafer (SiGeOI) followed by cMOS processing. The devices exhibit 3.6X hole mobility enhancement over Silicon (100) while allowing for V TH control with single high-k and metal gate stack. These attributes taken together constitute a simple non-planar cMOS integration sequence with enhanced drive current for future high performance technology nodes.