Device and method for pulse laser etching of conducting film on organic glass

The invention relates to a device for pulse laser etching of a conducting film on organic glass. The device comprises laser etching equipment, the laser etching equipment consists of a laser device (1), a light gate (2), a 1/2 wave plate (3), a Glan prism (4), a beam expander (5), a total-reflection lens (6), a galvanometer system (7) and a telecentric field lens (8), laser light emitted by the laser device (1) sequentially passes through the light gate (2), the 1/2 wave plate (3) and the Glan prism (4) and then is incident into the beam expander (5), light beams are coaxially expanded by the beam expander (5), the laser light reaches the total-reflection lens (6) after the beams are expanded and collimated by the beam expander (5), reflected laser light of the total-reflection lens (6) is incident into the galvanometer system (7), and emergent laser light of the galvanometer system (7) passes through the telecentric field lens (8) and is focused on a to-be-processed workpiece (12) absorbed on a vacuum absorption platform (13). The device for pulse laser etching of the conducting film on the organic glass is simple in processing, high in efficiency and free of consumables.