Fundamentals and applications of a plasma-processing system based on electron-beam ionization

2007 
Plasmas generated from moderate energy (2–5keV) electron beams (e-beam) have unique, attractive characteristics that are ideal for materials processing applications. These plasmas possess low electron temperatures (<0.5eV), variable plasma densities (109–1012cm−3) with an improved control of plasma species generation, and perhaps most importantly, a direct scalability to processing areas exceeding one square meter. These characteristics are due to the plasma ionization being driven by the e-beam instead of an external electromagnetic field as used in conventional processing plasma sources. Theoretical and experimental system details are discussed in terms of plasma operating conditions applied to three different surface modification approaches: metal nitriding, negative ion etching, and polymer surface energy tailoring.
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