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Copper interconnection for Si-LSI application
Copper interconnection for Si-LSI application
1995
Nobuyoshi Awaya
Kazuhide Ohno
Yoshinobu Arita
Keywords:
Chemical vapor deposition
Reactive-ion etching
Sputtering
Copper
Inorganic chemistry
Chemical-mechanical planarization
Materials science
Interconnection
Metallurgy
Correction
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