In-situ monitor and control using fast spectroscopic ellipsometry

A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance and spin-valve magnetic read-heads.© (1996) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.