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Nanoscaled Semiconductor Heterostructures for CMOS Transistors Formed by Ion Implantation and Hydrogen Transfer
Nanoscaled Semiconductor Heterostructures for CMOS Transistors Formed by Ion Implantation and Hydrogen Transfer
2007
Vladimir V. Popov
I. E. Tyschenko
Alexander Cherkov
M. Voelskow
Keywords:
Thin film
Heterojunction
Ion implantation
Indium antimonide
Amorphous silicon
Transistor
Quantum well
Semiconductor
Electronic engineering
Inorganic chemistry
Materials science
semiconductor heterostructures
Optoelectronics
hydrogen transfer
CMOS
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