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Etch Characteristics and Mechanism of TiSbTe Thin Films in Inductively-Coupled HBr-He, Ar, N2, O2 Plasma
Etch Characteristics and Mechanism of TiSbTe Thin Films in Inductively-Coupled HBr-He, Ar, N2, O2 Plasma
2016
Juntao Li
Yangyang Xia
Bo Liu
Qing Wang
Dan Gao
Zhen Xu
Weiwei Wang
Zhitang Song
Gaoming Feng
YaoHui Zhou
Lei Wang
Songlin Feng
Yipeng Chan
Keywords:
Plasma
Thin film
Analytical chemistry
Chemistry
Inorganic chemistry
o2 plasma
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