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CMOS IC Fabrication Issues for High-k Gate Dielectric and Alternate Electrode Materials
CMOS IC Fabrication Issues for High-k Gate Dielectric and Alternate Electrode Materials
2005
L. Colombo
A. L. P. Rotondaro
Mark R. Visokay
James J. Chambers
Keywords:
Gate dielectric
Semiconductor device fabrication
High-κ dielectric
Metal gate
Electrode
Work function
Electronic engineering
CMOS
Materials science
gate length
Optoelectronics
electrode material
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