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Effects of the Antenna Structure for Inductively Coupled Plasma to Etch Rate Uniformity
Effects of the Antenna Structure for Inductively Coupled Plasma to Etch Rate Uniformity
2019
Yuta Sugimoto
Masashi Yamage
Yoshie Okamoto
Tomoaki Yoshimori
Hidetada Azumano
Keywords:
Plasma
Analytical chemistry
Materials science
Inductively coupled plasma
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