Oxide-bonded molecular-beam epitaxial backside passivation process for large-format CCDs

We describe recent advances in backside passivation of large-format charge-coupled devices (CCDs) fabricated on 200- mm diameter wafers. These CCDs utilize direct oxide bonding and molecular-beam epitaxial (MBE) growth to enable high quantum efficiency in the ultraviolet (UV) and soft X-ray bands. In particular, the development of low-temperature MBE growth techniques and oxide bonding processes, which can withstand MBE processing, are described. Several highperformance large-format CCD designs were successfully back-illuminated using the presented process and excellent quantum efficiency (QE) and dark current are measured on these devices. Reflection-limited QE is measured from 200 nm to 800 nm, and dark current of less than 1e- /pixel/sec is measured at 40°C for a 9.5 μm pixel.