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Inductively coupled plasma etching of III-N layers by using a Cl2/N2 plasma
Inductively coupled plasma etching of III-N layers by using a Cl2/N2 plasma
2002
Sunwoon Kim
Kyuhan Lee
Seung-Jae Nam
Yunsung Huh
Junho Seo
Haeseok Lee
Keunseop Park
Keywords:
Plasma
Nuclear magnetic resonance
Physics
Reactive-ion etching
Etching
Inductively coupled plasma
Inductively coupled plasma atomic emission spectroscopy
Analytical chemistry
Condensed matter physics
Correction
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