In-situ preparation of VO2 films with controlled ionized fluxes density in HiPIMS and their regulation of thermal radiance
2020
Vanadium
dioxide is a well-known phase-change material on account
of its unique changes of optical property, which has seen a great
increase in its implementation for the regulation of thermal radiance.
However, the fabrication of VO2 needs strict conditions
for its narrow sliver in the phase diagram. In this paper, in situ
preparation of VO2 films by high-power impulse magnetron
sputtering is proposed, in which ionized flux density is used to direct
the crystal growth. Besides, the surface structure and thermochromic
behaviors of the deposited films are studied in detail. Furthermore,
simulations are carried out for the sake of optimizing the thickness
of VO2 films with the largest emissivity modulation ability,
and the experimental result reveals that their tuning range reaches
up to 0.32. It is believed that our work will find wide applications
not only in fundamental material science but also in thermal radiance
regulation.
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