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Study of SiC X-ray Mask Distortion Induced by Backetching Receding Subtractive Fabrication Process.
Study of SiC X-ray Mask Distortion Induced by Backetching Receding Subtractive Fabrication Process.
1995
Tsuboi S
Shoki T
Ohta T
Okuyama H
Ashikaga K
Yamashita Y
Ohkubo R
Yamaguchi Y.
Hoga H
Keywords:
Process (computing)
X-ray
Subtractive color
Distortion
Fabrication
Optics
Materials science
Correction
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