Effect of H2 concentration on r.f plasma-enhanced chemical vapour deposition of boron nitride coatings from the BCl3-N2-H2-Ar gas system

Abstract Boron nitride coatings were obtained by r.f. plasma-enhanced chemical vapour deposition (PECVD) from a BCl 3 -N 2 -H 2 -Ar mixture. Preliminary results on the effect of the hydrogen content in the gas mixture are reported. The characterization of the coatings and the gas phase analysis are discussed. Variations in the hydrogen content in the plasma can account for the decrease in oxygen content, increase in chlorine content and change in the B/N ratio in the deposited material. The morphology of the coatings also depends on the hydrogen content in the gas phase.