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Real-Time Process Control of Microcrystalline Silicon Thin Film Deposition in PECVD Chambers
Real-Time Process Control of Microcrystalline Silicon Thin Film Deposition in PECVD Chambers
2011
Carsten Agert
K. von Maydell
H. Auerswald
F. Stähr
D. Rogler
P. Klement
Keywords:
Thin film
Microcrystalline
Plasma-enhanced chemical vapor deposition
Process control
Materials science
Composite material
Silicon
optical emission spectroscopy
Optoelectronics
microcrystalline silicon
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