Selective emitter solar cell using two temperature steps furnace process

This investigation demonstrates the feasibility of a commercially available selective emitter process, based on screen-printing and furnace process. Screen-printed phosphorus paste and POCl 3 were the sources of diffusion for the heavily doped area and the lightly doped area, respectively. These two diffusion processes were performed in the furnace with a two diffusion steps. The sheet resistance of the lightly doped region was set to 80 Ω/square and that of the heavily doped region was set to 40 Ω/square. The screen-printed silver electrode was formed using a screen printer with a precise alignment function following the deposition of an anti-reflective layer. The photovoltaic performance is improved in terms of both short-circuit current and open-circuit voltage. The average absolute efficiency was increased by ∼ 0.3% – 0.8% with an area of 125mm × 125mm. An analysis of quantum efficiency revealed an increase in the response in the short wavelength region.