Development of sputter ion pump with strong magnetic field for obtaining of ultra-high vacuum

It is required an ultra-high vacuum (near 1E-11 Torr in the beam absence mode) in the synchrotron source of 4th generation SFR “SKIF”. Owing to the vacuum chambers have small molecular conductivity and the space limitation for pumps location, compact combined pumps application is required, i.e. pump on the base of non-evaporable getter and sputter ion pump. The modern pumps NEXTorr (SAES Getters, Italy) are not implemented the all of requirements on argon and methane for SFR “SKIF”. Therefore, it is necessary to create similar combined pumps by Russian manufacture. The first theoretical pumping speed calculations for one cell of diode type sputter ion pump and the whole of sputter ion pump are presented here. Also experimental results of pumping speed measurements depending on the magnetic field, diameter and length of cell for sputter ion pump are given.