An ion source with good beam current density uniformity for optical films deposition

Kuang Yuan

An ion source with good beam current density uniformity for optical films deposition

2001

Kuang Yuan

This paper introduces the structure design and performance parameters of a 120mm ion source with good beam current uniformity for optical films deposition.The factors effecting the uniformity of beam current density are discussed.

Keywords:

Atomic physics
Ion beam
Current density
Ion source
Beam (structure)
Materials science
beam current density
Deposition (law)
Optoelectronics
structure design

Correction
Source
Cite
Save
Machine Reading By IdeaReader

References

Citations