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Fluorine-containing Polymeric Inhibitor for Highly Selective and Durable Area-Selective Atomic Layer Deposition
Fluorine-containing Polymeric Inhibitor for Highly Selective and Durable Area-Selective Atomic Layer Deposition
2021
Yeon Rae Kim
In Su Jeon
Soonmin Yim
A-hyeon Lee
Seonwoo Kim
Minsu Kim
Eun-Ho Sohn
Wooseok Song
Ha Kyun Jung
Sun Sook Lee
Ki-Seok An
Keywords:
Materials science
Inorganic chemistry
highly selective
Atomic layer deposition
fluorine containing
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