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Fabrication of Submicron Gate Minimal SOI-CMOS Using Gate-First Process
Fabrication of Submicron Gate Minimal SOI-CMOS Using Gate-First Process
2018
Yongxun Liu
Kazushige Sato
Hiroyuki Tanaka
Kazuhiro Koga
Sommawan Khumpuang
Masayoshi Nagao
Takashi Matsukawa
Shiro Hara
Keywords:
Silicon on insulator
CMOS
Electronic engineering
Materials science
soi cmos
Fabrication
Optoelectronics
Correction
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