High-power TQW AlGaAs laser with new inner-stripe structure

An approach to mass-production of triple quantum well lasers with a buried-ridge, loss-guided inner-stripe structure is demonstrated, using a large-scale metalorganic chemical vapor deposition. The lasers obtained from nine epi-wafers grown at one time show the uniform characteristics. In regard to high-power characteristics, the fundamental transverse mode up to 100mW and the maximum output power of - 170mW are realized at room temperature. Even at 95 C, the light output power of 100mW is obtained. The lasers have been operating over 1000 hours without failure at 6O C, 50mW. To realize the further uniformity and reproducibility of the laser characteristics, we have Introduced a newly developed etching method with an etching stop layer in the ridge formation.