Ion beam-induced magnetic patterning at the sub-0.1 μm level

Abstract We present a method that allows magnetic patterning of a continuous magnetic film without significant modification of the surface roughness or of the film's optical indices. It involves ion irradiation of Co/Pt multilayers, using either a standard ion implantation technology combined with high resolution masking, or a focussed ion beam. We fabricated arrays of lines or dots whose magnetic properties differ on a sub-100 nm scale. We describe the ion collision physics on which the techniques are based, as well as some of the observed consequences on the micromagnetic properties of the arrays and on the ultimate resolution. Possible applications to high-density information storage are briefly discussed.